What is sapphire ingot and its application

Sapphire ingots are aluminum oxide crystals used to produce sapphire substrates

The application of sapphire ingot is the application of sapphire. As long as we know its performance, we can know where it is applied.

Sapphire has a hexagonal lattice structure, and many characteristics are determined by its crystal orientation. Through the growth of the epitaxial crystal film, different crystal orientations will present different lattices to match the target material. --Sapphire has certain birefringence characteristics, and special crystal axis is used in some optical fields, such as polarized substrates: --C-shaped sapphire substrates are used to grow III-V and II-VI group deposition films, such as Gallium nitride can produce blue LED products, laser diodes and infrared detector applications. -A-type substrate produces a uniform permittivity/dielectric, and a high degree of insulation is used in hybrid microelectronics technology. High-temperature superconductors can be produced from A-type substrate growth. --The different deposited silicon outer extension crystals grown on R-type substrates are used in microelectronic integrated circuits. Sapphire is the best choice for mixed substrates due to its high permittivity characteristics, such as applications in microwave integrated circuits. In addition, in the process of epitaxial silicon growth and film formation, high-speed integrated circuits and pressure sensors can also be formed. R-type substrate growth can also be used in the production of mounds, other superconducting components, high-resistance resistors, and gallium arsenide. --M, A, R type can grow non-polar or semi-polar gallium nitride. As a commercial product, sapphire still needs a lot of research to improve the material quality of gallium nitride epitaxy. Purity: --Sapphire is an insulating material whose semiconductor characteristics are changed by doping substances and impurities. Therefore, most of the purity control is not due to the strict control of the base material (silicon, gallium arsenide, indium phosphide...), but some minor dopants change its optical properties (color, light guide range), This is essential for certain applications (optical, military). --Since the purity of sapphire has a strong influence on the electrical properties and cross-contamination of the metal surface when applied to CMOS (complementary metal oxide semiconductor), it is also very important in the application of SoS (Silicon on Sapphire Large Scale Integration) . It has not been proven that the purity of sapphire has an impact on the application of LEDs. SoS manufacturers attribute its characteristics to the sapphire substrate. Guided mold method (fixed edge film feeding method): heating/melting→→→→putting seed crystal/pulling crystal→→→→cutting-2 meters long and 100 mm wide ribbon or 9*26, 12*20 feet The huge sapphire plate shape-the tubular sapphire is more than 65 feet long, or other shapes-the sapphire crystal is stretched into different crystal orientation arrangements through different substrates (A, R, C, other), mainly used in industry and machinery Manufacturing-in inert gas (nitrogen, argon) the growth rate is 1~5 cm/hour-different crystals can start to grow at the same time (sometimes more than 20 kinds)